Laser calibration

Date	Test structure	Defocus	Depth	Remarks	Name
14.05.2012	Defocus_5x	3 mm	52 µm	warm up ~1h	Brunne
15.05.2012	Defocus_5x	3 mm	49.7 µm	warm up ~1h	Brunne
18.05.2012	Defocus_5x	3 mm	??		Wiedenmann
23.05.2012	Defocus_5x	3 mm	48.4 µm	warm up: ~2h	Brunne
24.05.2012	Defocus_5x	3 mm	39.3 µm	warm up: ~30 min	Stürmer
24.05.2012	Defocus_semiHighRes_3mm_5x	3 mm	53.7 µm	warm up: ~ 1h	Stürmer
25.05.2012	Defocus_semiHighRes_3mm_5x	constant between 3 - 4 mm	47.08 µm	warm up: ~2.5 h (? user before)	Stürmer
05.06.2012	Defocus_5x	3 mm	41 µm	warm up: ?	Brunne
08.06.2012	Defocus_5x	0 mm	49.3 µm	2h warm up	Brunne
11.06.2012	Defocus_5x	0 mm	44 µm	?	Spengler / Stürmer
11.06.2012	Defocus_5x	0mm	49.8µm	long warm up/multiple users	Brunne
23.07.2012	Defocus_5x	0mm	51.6 µm	Long warmup	Brunne
21.11.2012	Defocus_5x	0,5mm	44 µm	Long warmup	Brunne
15.12.2012	Defocus_5x	-1 mm	38.9 µm	warm up: 3h	Brunne
17.12.2012	Defocus_5x	1 mm	54 µm	Current through diodes increased to 30.2 A	Brunne
17.12.2012	Defocus_5x	0 mm	52.4 µm	Defocus adjusted to 131	Brunne
11.01.2013	Defocus_5x	-2,5 mm	35 µm	warm up: 2,5h	Wiedenmann
07.02.2013	Defocus_5x	-2,5 mm	36 µm		Schatz/Wiedenmann
24.09.2013	Defocus_5x	0 mm	40 µm	long warm up (>2h)	Brunne

Defocus_5x test structure in silicon: Result of Profilometer measurement